Development of next-generation power devices is needed for energy saving in a low carbon society. Diamond is a potentially important power device material due to its excellent physical and electronic ...
A new approach combining atomic layer deposition and organic film etch process may solve critical challenges in the various processes in advanced nodes. We demonstrated a high selective and ...
The process comprises a surface nitrogenation step via N + ion bombardment, followed by O 2 plasma treatment to form volatile etching byproducts. This approach enables subatomic-level etching ...
A wide variety of devices have their properties limited due to the inherent properties of the materials that they are composed of. Yet, at the nanoscale, the properties of devices no longer rely ...
Co-Developed with PSI and Fraunhofer ENAS, MacEtch Technology Enables Scalable Plasma-Free Silicon Etching LIVINGSTON, Scotland, Nov. 19, 2025 (GLOBE NEWSWIRE) -- memsstar Ltd., a leading provider of ...
World energy consumption has been increasing year by year, and a global-scale energy shortage is of great concern. Because of this reason, it is important to use the energy (electricity) produced by ...
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