After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

Extracting hydrogen from water through electrolysis offers a promising route for increasing the production of hydrogen, a clean and environmentally friendly fuel. But one major challenge of water ...

With photolithography not able to produce circuit lines much thinner than 100nm, a major focus of research into nanotechnology is in developing means to construct circuits that break the 100nm barrier ...

Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...

How chemical etching keeps tooling costs low and allows for rapid design changes. 1. Chemical etching can create complex, ...

Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...

Photochemical etching is a machining technique that leverages the principles behind photography to shape a piece of sheet metal and turn it into a finished product or component. The modern form of ...

ITHACA, N.Y. — Cornell University researchers have discovered yet another method for shrinking the design rules on silicon chips. The researchers demonstrated the technique, called controlled etching ...

Ion beam expertise is critical to delivering the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to ...

Etching is a process that removes unwanted material from a wafer, which is also known as a "slice" or "substrate." Wafers are made of semiconducting material such as crystalline silicon and are used ...