After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...
After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in ...
New GaN power electronics are being developed for power conversion and delivery. In electric transportation such as Electric and Hybrid Electric Vehicles (EV and HEV), these devices are becoming ...
What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...
The fundamentals of a good Bosch etching system are described below; There are a number of significant features of the equipment used for Bosch processing which differ from normal ICP systems: In ...
In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...
What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...
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