A 2D material called chromium oxychloride dramatically outperforms traditional hard masks in chip fabrication, resisting plasma etching far better at nanoscale thicknesses.

Making computer chips smaller is not just about better design. It also depends on a critical step in manufacturing called patterning, where nanoscale ...

A research team has successfully designed and developed a proprietary non-precious metal oxygen evolution reaction (OER) catalyst featuring a layered structure optimized for anion exchange membrane ...

Researchers from the Department of Physics and the University Institute of Materials at the University of Alicante (UA) and the Low Temperature and High Magnetic Field Laboratory at the Autonomous ...

This FAQ analyzes the open-drain physical layer and the nuances of register-level addressing to better understand I2C communication.